02360nas a2200145   4500008004100000050001500041245010000056210006900156300001400225490000700239520185100246100002302097700001902120856007502139       2005                        eng d  aLBNL-5761000aPlasma-Based Ion Implantation and Deposition: A Review of Physics, Technology, and Applications0 aPlasmaBased Ion Implantation and Deposition A Review of Physics   a1944-19590 v333 a<p>After pioneering work in the 1980s, plasma-based ion implantation (PBII) and plasma-based ion implantation and deposition (PBIID) can now be considered mature technologies for surface modification and thin film deposition. This review starts by looking at the historical development and recalling the basic ideas of PBII. Advantages and disadvantages are compared to conventional ion beam implantation and physical vapor deposition for PBII and PBIID, respectively, followed by a summary of the physics of sheath dynamics, plasma and pulse specifications, plasma diagnostics, and process modelling. The review moves on to technology considerations for plasma sources and process reactors. PBII surface modification and PBIID coatings are applied in a wide range of situations. They include the by-now traditional tribological applications of reducing wear and corrosion through the formation of hard, tough, smooth, low-friction and chemically inert phases and coatings, e.g. for engine components. PBII has become viable for the formation of shallow junctions and other applications in microelectronics. More recently, the rapidly growing field of biomaterial synthesis makes used of PBII&amp;D to produce surgical implants, bio- and blood-compatible surfaces and coatings, etc. With limitations, also non-conducting materials such as plastic sheets can be treated. The major interest in PBII processing originates from its flexibility in ion energy (from a few eV up to about 100 keV), and the capability to efficiently treat, or deposit on, large areas, and (within limits) to process non-flat, three-dimensional workpieces, including forming and modifying metastable phases and nanostructures. We use the acronym PBII&amp;D when referring to both implantation and deposition, while PBIID implies that deposition is part of the process.</p>1 aPelletier, Jacques1 aAnders, André  uhttps://facades.lbl.gov/publications/plasma-based-ion-implantation-and