01800nas a2200169   4500008004100000050001500041245016500056210006900221300001400290490000700304520115200311100002001463700002501483700002301508700002301531856007601554       1998                        eng d  aLBNL-4182000aEllipsometry on Sputter Deposited Tin Oxide Films: Optical Constants Versus Stoichiometry Hydrogen Content, and Amount of Electrochemically Intercalated Lithium0 aEllipsometry on Sputter Deposited Tin Oxide Films Optical Consta  a7734-77410 v373 a<p>Tin oxide thin films were deposited by reactive radio-frequency magnetron sputtering onto In<sub>2</sub>O<sub>3</sub>:Sn coated and bare glass substrates. Optical constants in the 300-2500 nm wavelength range were determined by a combination of variable-angle spectroscopic ellipsometry and spectrophotometric transmittance measurements. Surface roughness was modeled from optical measurements and compared with atomic-force microscopy. The two techniques gave consistent results. The fit between experimental optical data and model results could be significantly improved when it was assumed that the refractive index of the Sn oxide varied across the film thickness. Varying the oxygen partial pressure during deposition made it possible to obtain films whose complex refractive index changed at the transition from SnO to SnO<sub>2</sub>. An addition of hydrogen gas during sputtering led to lower optical constants in the full spectral range in connection with a blue shift of the band gap. Electrochemical intercalation of lithium ions into the Sn oxide films raised their refractive index and enhanced their refractive-index gradient.</p>1 aIsidorsson, Jan1 aGranqvist, Claes, G.1 avon Rottkay, Klaus1 aRubin, Michael, D.  uhttps://facades.lbl.gov/publications/ellipsometry-sputter-deposited-tin01350nas a2200181   4500008004100000245007700041210006900118260001200187300001400199490000700213520076000220100002100980700001901001700002501020700002301045700002301068856007701091       1998                        eng d00aOptical Constants of Sputter-Deposited Ti-Ce Oxide and Zr-Ce Oxide Films0 aOptical Constants of SputterDeposited TiCe Oxide and ZrCe Oxide   c09/1998  a5993-60010 v373 a<p>Films of Ti oxide, Zr oxide, Ce oxide, Ti-Ce oxide, and Zr-Ce oxide were made by means of reactive dc magnetron sputtering in a multitarget arrangement. The films were characterized by x-ray diffraction and electrochemical measurements, both techniques being firmly connected to stoichiometric information. The optical constants n and k were evalued from spectrophotometry and from variable-angle spectroscopic ellipsometry. The two analyses gave consistent results. It was found that n for the mixed-oxide films varied smoothly between the values for the pure oxides, whereas k in the band-gap range showed characteristic differences between Ti-Ce oxide and Zr-Ce oxide. It is speculated that this difference is associated with structural effects.</p>1 aVeszelei, Monica1 aKullman, Lisen1 aGranqvist, Claes, G.1 avon Rottkay, Klaus1 aRubin, Michael, D.  uhttps://facades.lbl.gov/publications/optical-constants-sputter-deposited