01511nas a2200181   4500008004100000050001500041245007100056210006900127260002400196490001000220520090600230100002701136700002301163700002401186700002101210700002301231856007501254       1998                        eng d  aLBNL-4238100aTungsten-Vanadium Oxide Sputtered Films for Electrochromic Devices0 aTungstenVanadium Oxide Sputtered Films for Electrochromic Device  aBoston, MAc11/19980 v98-263 a<p>Mixed vanadium and tungsten oxide films with compositions ranging from 0 to 100% vanadium (metals basis) were prepared by reactive sputtering from metallic vanadium and tungsten targets in an atmosphere of argon and oxygen. The vanadium content varied smoothly with the fraction of total power applied to the vanadium target. Films containing vanadium were more color neutral than pure tungsten oxide films, tending to gray-brown at high V fraction. The electrochromic switching performance of these films was investigated by in situ monitoring of their visible transmittance during lithium insertion/extraction cycling in a non-aqueous electrolyte (1M LiClO<sub>4</sub> in PC). the solar transmittance and reflectance was measured ex-situ. Films with vanadium content greater than about 15%, exhibited a marked decrease in switching range. The coloration efficiencies followed a similar trend.</p>1 aRichardson, Thomas, J.1 avon Rottkay, Klaus1 aSlack, Jonathan, L.1 aMichalak, Franck1 aRubin, Michael, D.  uhttps://facades.lbl.gov/publications/tungsten-vanadium-oxide-sputtered