01937nas a2200133   4500008004100000050001400041245009400055210006900149260002900218520143800247100001901685700002101704856007801725       1995                        eng d  aLBL-3852600aSol-Gel Deposited Amorphous Tantalum Oxide and Niobium Oxide Films as Protonic Conductors0 aSolGel Deposited Amorphous Tantalum Oxide and Niobium Oxide Film  aToronto, Canadac06/19953 a<p>In this work we report on the preparation of tantalum oxide and niobium oxide films by the sol-gel method for use as proton ion conductors in electrochromic devices. Measurement of the proton conductivity was derived from impedence spectroscopy measurements. The proton conductivity for Ta<sub>2</sub>O<sub>5</sub> and NbO<sub>5</sub> films was 4.6 x 10<sup>-6</sup> Scm<sup>-1</sup> and 3.2 x 10<sup>-7</sup> Scm<sup>-1</sup> respectively. The structural and chemical properties of the films were investigated by X-ray diffraction, X-ray photoelectron spectroscopy and scanning electron microscopy. These films were found to be amorphous and close to the stoichometry of Ta<sub>2</sub>O<sub>5</sub> and NbO<sub>5</sub> respectively. In order to estimate the compatibility of these sol-gel deposited layers as ion conductors for EC devices, we investigated tantalum oxide and niobium oxide films deposited on sputtered WO<sub>3</sub> films. Charge balance and coloration characteristics were investigated during voltammetric cycling in a pH 2 liquid electrolyte. Spectral transmittance was measured for colored and bleached conditions. The photopic weighted transmittance change and solar weighted transmittance change were T<sub>p</sub>=35.2% - 21.8% and T<sub>s</sub>=75.7% - 14.2% for tantala films on tungsten oxide. For niobia on tungsten oxide the values were T<sub>p</sub>=85.3% - 35.2% and T<sub>s</sub>=75.8% - 28.1%.</p>1 aÖzer, Nilgün1 aLampert, Carl, M  uhttps://facades.lbl.gov/publications/sol-gel-deposited-amorphous-tantalum