01116nas a2200145   4500008004100000050001400041245010200055210006900157300001100226490000700237520061100244100002200855700001900877856007400896       2008                        eng d  aLBNL-190E00aGasless sputtering: Opportunities for ultraclean metallization, coatings in space, and propulsion0 aGasless sputtering Opportunities for ultraclean metallization co  a2215030 v923 a<p>Pulsed magnetron sputtering was demonstrated in high vacuum: no sputter gas was used at any time. Sustained selfsputtering was initiated by multiply charged ions from a short vacuum arc. Copper ion currents to an ion collector in excess of 30 A were measured, implying a plasma density of about 6 x10<sup>18</sup> m<sup>-3</sup>. This technology may prove useful for metal coatings free of noble gas inclusions and suggests that magnetrons could operate in the vacuum of space. In addition to coating objects in space, the momentum of the sputtered atoms and ions may be utilized in space thrusters.</p>1 aAndersson, Joakim1 aAnders, André  uhttps://facades.lbl.gov/publications/gasless-sputtering-opportunities