01287nas a2200145   4500008004100000050001500041245006900056210006700125520078700192100001900979700002000998700002301018700002201041856007801063       2006                        eng d  aLBNL-6173300aFiltered cathodic arc deposition with ion-species-selective bias0 aFiltered cathodic arc deposition with ionspeciesselective bias3 a<p>A dual-cathode arc plasma source was combined with a computer-controlled bias amplifier such as to synchronize substrate bias with the pulsed production of plasma. In this way, bias can be applied in a material-selective way. The principle has been applied to the synthesis metal-doped diamond-like carbon films, where the bias was applied and adjusted when the carbon plasma was condensing, and the substrate was at ground when the metal was incorporated. In doing so, excessive sputtering by too-energetic metal ions can be avoided while the sp<sup>3</sup>/sp<sup>2</sup> ratio can be adjusted. It is shown that the resistivity of the film can be tuned by this species-selective bias. The principle can be extended to multiple-material plasma sources and complex materials.</p>1 aAnders, André1 aPasaja, Nitisak1 aSansongsiri, Sakon1 aLim, Sunnie, H.N.  uhttps://facades.lbl.gov/publications/filtered-cathodic-arc-deposition-ion