01510nas a2200181   4500008004100000050001500041245010000056210006900156300001400225490000700239520088500246100002101131700002301152700002701175700002401202700002301226856007901249       1998                        eng d  aLBNL-4227600aElectrochromic Lithium Nickel Oxide Thin Films by RF-Sputtering from a LiNiO<sub>2</sub> Target0 aElectrochromic Lithium Nickel Oxide Thin Films by RFSputtering f  a3085-30920 v443 a<p>Thin films of lithium nickel oxide were deposited by rf sputtering from a stoichiometric LiNiO<sub>2</sub> target. The composition and structure of these films depended on the oxygen pressure during deposition (sputtering gas is Argon), and, to a certain extent, the target history. The sputtering geometry, i.e. the substrate to target distance and the sputtering angle were also critical. the films exhibit excellent reversibility in the potential range 1.1V to 3.8 V vs Li/Li<sup>+</sup> and could be cycled in a liquid electrolyte half cell for more than 3000 cycles with a switching range ΔT<sub>vis</sub> close to 70%. The coloration efficiency in the visible was typically -30 to -40 cm<sup>2</sup> C<sup>-1</sup>. The switching performance of a device utilizing a lithium nickel oxide film as counter electrode for a tungsten oxide electrochromic film is reported.</p>1 aMichalak, Franck1 avon Rottkay, Klaus1 aRichardson, Thomas, J.1 aSlack, Jonathan, L.1 aRubin, Michael, D.  uhttps://facades.lbl.gov/publications/electrochromic-lithium-nickel-oxide-1