@article {1859,
	title = {The structure and electron energy loss near edge structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering},
	journal = {Journal of Physics: Condensed Matter},
	volume = {20},
	year = {2008},
	month = {04/2008},
	pages = {175216},
	abstract = {<p>The microstructure and energy-loss near-edge structure (ELNES) of pulsed cathodic arc and pulsed magnetron sputtered WO<sub>3</sub> thin films were investigated. It was found that the cathodic arc deposited material consisted of the α-WO<sub>3</sub> phase with a high degree of crystallinity. In contrast, the magnetron sputtered material was highly disordered making it difficult to determine its phase. A self-consistent real space multiple scattering approach was used to calculate the NES of the various phases of WO<sub>3</sub>. Each phase was found to exhibit a unique NES allowing different phases of WO<sub>3</sub> to be identified. The real space approach also allowed the origin of the main features in the NES to be investigated as the cluster size increased. The calculated NES for the room temperature γ-WO<sub>3</sub> was found to compare well to previous X-ray absorption spectra and to NES obtained by full-potential band structure calculation.</p>},
	doi = {10.1088/0953-8984/20/17/175216},
	author = {Matthew R. Field and Dougal G. McCulloch and Sunnie H.N. Lim and Andr{\'e} Anders and Vicki J. Keast and R.W. Burgess}
}
