@article {11879,
	title = {Filtered cathodic arc deposition with ion-species-selective bias},
	journal = {Review of Scientific Instruments},
	year = {2006},
	abstract = {<p>A dual-cathode arc plasma source was combined with a computer-controlled bias amplifier such as to synchronize substrate bias with the pulsed production of plasma. In this way, bias can be applied in a material-selective way. The principle has been applied to the synthesis metal-doped diamond-like carbon films, where the bias was applied and adjusted when the carbon plasma was condensing, and the substrate was at ground when the metal was incorporated. In doing so, excessive sputtering by too-energetic metal ions can be avoided while the sp<sup>3</sup>/sp<sup>2</sup> ratio can be adjusted. It is shown that the resistivity of the film can be tuned by this species-selective bias. The principle can be extended to multiple-material plasma sources and complex materials.</p>},
	author = {Andr{\'e} Anders and Nitisak Pasaja and Sakon Sansongsiri and Sunnie H.N. Lim}
}
@article {12188,
	title = {Plasma biasing to control the growth conditions of diamond-like carbon},
	journal = {Surface and Coatings Technology},
	volume = {201},
	year = {2006},
	month = {01/2007},
	pages = {4628-4632},
	chapter = {4628},
	abstract = {<p>It is well known that the structure and properties of diamond-like carbon, and in particular the sp<sup>3</sup>/sp<sup>2</sup> ratio, can be controlled by the energy of the condensing carbon ions or atoms. In many practical cases, the energy of ions arriving at the surface of the growing film is determined by the bias applied to the substrate. The bias causes a sheath to form between substrate and plasma in which the potential difference between plasma potential and surface potential drops. In this contribution, we demonstrate that the same results can be obtained with grounded substrates by shifting the plasma potential. This plasma biasing (as opposed to substrate biasing) is shown to work well with pulsed cathodic carbon arcs, resulting in tetrahedral amorphous carbon (ta-C) films that are comparable to the films obtained with the conventional substrate bias. To verify the plasma bias approach, ta-C films were deposited by both conventional and plasma bias and characterized by transmission electron microscopy (TEM) and electron energy loss spectrometry (EELS). Detailed data for comparison of these films are provided.</p>},
	keywords = {Diamond-like carbon films, Electron energy loss spectroscopy, Plasma bias, Substrate bias, transmission electron microscopy},
	doi = {10.1016/j.surfcoat.2006.09.313},
	author = {Andr{\'e} Anders and Nitisak Pasaja and Sunnie H.N. Lim and Tim C. Petersen and Vicki J. Keast}
}
