@conference {1815,
	title = {Sol-Gel Deposited Amorphous Tantalum Oxide and Niobium Oxide Films as Protonic Conductors},
	booktitle = {Window Innovations 95 Conference Proceedings},
	year = {1995},
	month = {06/1995},
	address = {Toronto, Canada},
	abstract = {<p>In this work we report on the preparation of tantalum oxide and niobium oxide films by the sol-gel method for use as proton ion conductors in electrochromic devices. Measurement of the proton conductivity was derived from impedence spectroscopy measurements. The proton conductivity for Ta<sub>2</sub>O<sub>5</sub> and NbO<sub>5</sub> films was 4.6 x 10<sup>-6</sup> Scm<sup>-1</sup> and 3.2 x 10<sup>-7</sup> Scm<sup>-1</sup> respectively. The structural and chemical properties of the films were investigated by X-ray diffraction, X-ray photoelectron spectroscopy and scanning electron microscopy. These films were found to be amorphous and close to the stoichometry of Ta<sub>2</sub>O<sub>5</sub> and NbO<sub>5</sub> respectively. In order to estimate the compatibility of these sol-gel deposited layers as ion conductors for EC devices, we investigated tantalum oxide and niobium oxide films deposited on sputtered WO<sub>3</sub> films. Charge balance and coloration characteristics were investigated during voltammetric cycling in a pH 2 liquid electrolyte. Spectral transmittance was measured for colored and bleached conditions. The photopic weighted transmittance change and solar weighted transmittance change were T<sub>p</sub>=35.2\% - 21.8\% and T<sub>s</sub>=75.7\% - 14.2\% for tantala films on tungsten oxide. For niobia on tungsten oxide the values were T<sub>p</sub>=85.3\% - 35.2\% and T<sub>s</sub>=75.8\% - 28.1\%.</p>},
	author = {Nilg{\"u}n {\"O}zer and Carl M Lampert}
}
