@article {11879,
	title = {Filtered cathodic arc deposition with ion-species-selective bias},
	journal = {Review of Scientific Instruments},
	year = {2006},
	abstract = {<p>A dual-cathode arc plasma source was combined with a computer-controlled bias amplifier such as to synchronize substrate bias with the pulsed production of plasma. In this way, bias can be applied in a material-selective way. The principle has been applied to the synthesis metal-doped diamond-like carbon films, where the bias was applied and adjusted when the carbon plasma was condensing, and the substrate was at ground when the metal was incorporated. In doing so, excessive sputtering by too-energetic metal ions can be avoided while the sp<sup>3</sup>/sp<sup>2</sup> ratio can be adjusted. It is shown that the resistivity of the film can be tuned by this species-selective bias. The principle can be extended to multiple-material plasma sources and complex materials.</p>},
	author = {Andr{\'e} Anders and Nitisak Pasaja and Sakon Sansongsiri and Sunnie H.N. Lim}
}
